Product Description

The Photovoltaic Scribing Machine integrates dual laser technology for precise patterning and engraving of photovoltaic substrates in research, development, and production environments.

Key Features:

• Self-developed dual laser system with integrated wavelength capabilities compatible with the entire P1-P3 scribing process
• Processing compatibility with battery cells ranging from 100-300mm in width
• Ultra-precision scribing with accuracy of ≤±10μm/m and line spacing capabilities as narrow as ≥5μm
• Adjustable line width from 20-100μm with exceptional stability (≤±2% variation)
• Minimal thermal impact (<2μm) with high-precision marking straightness (±3μm) and repeatability (±5μm)
• Planar motion straightness of ±3μm/300mm for consistent processing across larger substrates
• Integrated red/green light capability enabling complete P1P2P3 scribing operations on a single machine

Key Technical Specs:

• Compatible Cell Width: 100 - 300mm
• Scribing Accuracy: ≤ ±10μm/m
• Scribing Line Spacing: ≥ 5μm
• Line Width Range: 20 - 100μm
• Line Width Stability: ≤ ±2%
• Marking Width: > 20μm

Serial Number: 41-90542