Filmetrics® F3-sX Film Thickness Measurement Series

Overview

Single-spot thin-film reflectometer series designed to measure semiconductor and dielectric layers up to 3mm thick. Measurement spot size: 10µm diameter; measurement rate: up to 1 kHz. Thickness performance is film stack dependent (Thickness Range* note: Film stack dependent). Available wavelength/thickness variants (model-specific): F3-s980 — Thickness Range*: 10µm – 1mm; Wavelength Range: 960 – 1000nm. F3-s1310 — Thickness Range*: 15µm – 2mm; Wavelength Range: 1280 – 1340nm. F3-s1550 — Thickness Range*: 25µm – 3mm; Wavelength Range: 1520 – 1580nm. System package includes an integrated spectrometer/light source unit, FILMeasure software, a single-spot measurement stage with 10µm spot size, a Si reflectance standard and FILMeasure standalone software for remote data analysis. Manufacturer support is provided 24-hour (M-F) via phone, email and online channels by application engineers. Intended for industrial semiconductor and thin-dielectric measurement tasks in production, at-line quality control, and laboratory process development where single-spot, high-speed thickness readings are required. The 10µm diameter spot is suitable for small features or localized areas on wafers and coated substrates. Choose wavelength/variant according to film thickness and optical transparency: F3-s980 for thinner stacks (10µm – 1mm) in the 960–1000nm band, F3-s1310 for intermediate thicknesses (15µm – 2mm) at 1280–1340nm, and F3-s1550 for the thickest stacks (25µm – 3mm) at 1520–1580nm. The integrated spectrometer/light source and FILMeasure software support rapid data collection (up to 1 kHz) and remote analysis workflows; final measurement capability should be confirmed against the specific film stack since thickness range is stack dependent.