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Applied MaterialEndura® CuBS RF XT PVD

Endura® CuBS RF XT PVD

Applied Material

Categories:
High Power Impulse Magnetron Sputtering Systems (HiPIMS)
Equipment

Model Overview

Endura® CuBS RF XT PVD is a physical vapor deposition (PVD) tool from Applied Materials positioned for metals deposition in semiconductor manufacturing. The model name indicates a CuBS (copper barrier/seed) process focus and RF operation, meaning the platform uses radio-frequency plasma excitation a...

Technical Specifications

Applicationmetals deposition in semiconductor manufacturing
Category PathSurface Treatment > Physical Vapor Deposition (PVD) > Sputtering Systems > High Power Impulse Magnetron Sputtering Systems (HiPIMS)
Process FocusCuBS (copper barrier/seed)
Operation ModeRF (radio-frequency plasma excitation)
Product FamilyEndura
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