【DISCONTINUED】JSM-IT800 Schottky Field Emission Scanning Electron Microscope

Overview

JEOL JSM-IT800 is a Schottky field-emission scanning electron microscope built around an In-lens Schottky Plus field emission electron gun with a landing voltage range of 0.01 to 30 kV and a built-in Aperture Angle Control Lens (ACL). Column/objective options include Hybrid Lens (HL), Semi-in-lens (is, i) and Super Hybrid Lens (SHL / SHLs) configurations. Probe current ranges by column: a few pA to 300 nA (30 kV) / a few pA to 100 nA (5 kV) for HL and is variants; a few pA to 500 nA (30 kV) / a few pA to 100 nA (5 kV) for i, SHLs and SHL variants. Emitter warranty period: 3 years. Resolution and imaging performance are configuration dependent; published best-resolution entries include 0.7nm (20kV), 0.6nm (15kV), 0.5nm (15kV) and low-voltage capabilities such as 1.3nm (1kV), 1.0nm (1kV), 0.7–1.1nm (1kV depending on column) and 0.9nm (500V) for the SHLs variant. Magnification ranges (photo/display) span from ×10 or ×25 up to ×2,000,000 for photographic magnification and display magnifications up to ×5,480,000 (1,280 × 960 pixels), enabling high-resolution imaging and large-magnification workflows for materials and device inspection. The system targets industrial R&D and production laboratories requiring high-resolution imaging combined with analytical capability. Standard and variant detectors include Secondary Electron Detector (SED) plus Upper Electron Detector (UED), Upper In-lens Detector (UID), Upper hybrid detector (UHD) depending on column choice, supporting topographic and compositional contrast. A full eucentric goniometer stage with 5-axis motor drive and draw-out specimen stages (Type1: max Ø170 mm × 45 mm height, WD 5 mm, X:70mm Y:50mm Z:1 to 41mm Tilt: -5 to 70° Rotation: 360°; Type2 option: max Ø200 mm × 55 mm height, WD 5 mm, X:100mm Y:100mm Z:1 to 50mm Tilt: -5 to 70° Rotation: 360°; Type3 option: max Ø200 mm × 45 mm height, WD 5 mm, X:140mm Y:80mm Z:1 to 41mm Tilt: -5 to 70° Rotation: 360°) supports wafer-scale and tilted/rotated sample analysis (e.g., EBSD). Optional low vacuum mode plus analytical options (EDS, WDS, EBSD, CL) and probe currents up to 500 nA (30 kV) in certain configurations make the platform suitable for semiconductor device analysis, magnetic materials research, EBSD mapping, biological specimen imaging including correlative workflows (array tomography, CLEM), and other industrial materials characterization tasks where combined imaging and microanalysis are required.