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AJA International, Inc.SBE-6 Sputter Beam Epitaxy Systems

SBE-6 Sputter Beam Epitaxy Systems

AJA International, Inc.

Categories:
High Power Impulse Magnetron Sputtering Systems (HiPIMS)
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Model Overview

The SBE-6 Sputter Beam Epitaxy Systems are HV and UHV thin film deposition systems built on the ATC Series Platform and configured with an off-axis gun geometry that provides MBE-like epitaxy for thin film growth. The chamber has six ports arranged around the periphery pointing toward the chamber ax...

Technical Specifications

Uniformity+/- 3% on 4” substrates
Gun MountingUp to six 2” guns – Stiletto (HV) or A300-XP (UHV) can be mounted in the system.
Cooling OptionsCooled substrate carriers utilizing either water or LN2 are also available depending on the application requirement.
Substrate Heatersare available to reach up to 1000°C and feature reactive gas injection rings, RF/DC bias capability, in-situ manual or motorized Z motion (for working distance adjustment and load-lock transfer) and in-situ mask exchange (available only with certain configurations).
Control System (phase Ii-au)LabVIEW based Phase II-Au control system with a large 22” articulating screen with wireless keyboard and mouse; allows up to 104 unique user entry points (password protected).

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