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Applied MaterialCentura® Ultima HDP CVD®

Centura® Ultima HDP CVD®

Applied Material

Categories:
Batch PECVD Systems
Equipment

Model Overview

Centura® Ultima HDP CVD® is an Applied Materials high-density plasma chemical vapor deposition (HDP CVD) system specified for dielectric deposition in semiconductor manufacturing. The tool uses HDP plasma-driven CVD to deposit dielectric films with plasma-enhanced film densification and conformality...

Technical Specifications

TechnologyHDP plasma-driven CVD
Applicationdielectric deposition in semiconductor manufacturing
Process Typehigh-density plasma chemical vapor deposition (HDP CVD)
Category PathSurface Treatment > Chemical Vapor Deposition (CVD) > Plasma-Enhanced Chemical Vapor Deposition (PECVD) Systems > Batch PECVD Systems
Product Classproduction-class deposition tool
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