HiPace 30 Neo

Overview

HiPace 30 Neo is a HiPace-series vacuum pump model offered by Pfeiffer Vacuum. It is a high-vacuum stage device intended for integration into industrial vacuum systems to achieve high/ultra-high vacuum levels. The unit is designed to be used in combination with a backing (roughing) pump and to form part of a multi-stage vacuum pumping arrangement. For procurement and system integration, the most decision-relevant technical attributes to verify from the HiPace 30 Neo datasheet are pumping speed (l/s), ultimate pressure, allowable gas throughput and gas composition limits, required backing pump specifications, electrical power and control-interface requirements, inlet/outlet flange types and orientations, and any cooling or mounting constraints. Consider maintenance and service aspects such as recommended service interval, replacement parts availability, and whether the unit uses magnetic or mechanical bearings when comparing models. The HiPace 30 Neo is suited to industrial-scale applications that require a dedicated high-vacuum stage in production or R&D vacuum chains, for example thin-film deposition, physical vapor deposition (PVD) and coating tools, vacuum metallization, analytical instruments, and vacuum chambers used in process development. In these contexts it is installed downstream of a roughing pump and controlled as part of the facility vacuum system. When specifying this pump for a process, select the configuration and controller options to match required pumping speed, continuous gas load and allowed gas species, electrical and communication interfaces for process control, and the physical mounting/flange compatibility with the target chamber. Confirm service and spare-parts support as part of total cost of ownership for continuous industrial operation.