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Model C&D P9000 / OAI 6000: Integrated Lithography Cell
Optical Associates, Inc. (OAI)
Categories:
Additive processing
Model Overview
The Model C&D P9000 / OAI 6000 is an integrated lithography cell intended for photolithographic patterning of semiconductor wafers. As an integrated cell, it combines an exposure module with tool-level automation and an enclosed process environment to deliver coordinated alignment, exposure and wafe...
Technical Specifications
Modulesexposure module,tool-level automation,enclosed process environment
Processphotolithographic patterning of semiconductor wafers
Enclosureenclosed process environment
Functionsalignment,exposure,wafer handling
Category PathAdditive processing
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