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Intlvac Thin Film CorporationNanochrome™ V: Advanced Sputtering System

Nanochrome™ V: Advanced Sputtering System

Intlvac Thin Film Corporation

Categories:
High Power Impulse Magnetron Sputtering Systems (HiPIMS)
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Model Overview

The Nanochrome™ V is a plasma-assisted evaporation and sputtering system with a stainless steel clam shell deposition chamber measuring 48” diameter x 40” height. Substrates are mounted on a rotatable 500mm OD disk that supports parts up to 20kg and can be loaded via manual or automatic substrate lo...

Technical Specifications

PumpsTwo wide-range maglev pumps and Leybold dry pumps
HeatingIR radiators capable of heating substrates up to 200°C
Gas ValvesPneumatically actuated gas line valves
Substrate OD500mm OD
Vacuum PumpingHigh vacuum achieved in 45 minutes to 5E-6 Torr

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