MMX series

Overview

MMX series is a system purpose-built for placement metrology for the mature semiconductor market. It measures the positions of the written pattern to evaluate that patterns are properly aligned, thereby ensuring the quality of the produced semiconductor photomask. The system is built on the field-proven SLX platform and leverages more than 20 years of experience in mask metrology systems from the flat panel display industry. It is based on the Evo control platform with modern software and electronics architecture. The MMX series offers two throughput modes, HT and HA (Preliminary), with the following specifications: short term repeatability (3σ) 5 nm (HT) and 3 nm (HA), long term repeatability (3σ) 7 nm (HT) and 4 nm (HA), accuracy 12 nm (HT) and 5 nm (HA), and MAM time 6 secs (HT) and 12 secs (HA). The system can handle semiconductor substrate sizes from 5” to 9” with flexible magazine configuration to maximize batch processing capability, and it offers high throughput and flexible handling options for cost-efficient production while maintaining consistent and stable tool performance over time. Measure positions of written patterns on semiconductor photomasks to evaluate alignment and ensure mask quality. Operate in either a high-throughput mode (HT) or a high-accuracy mode (HA, Preliminary) to capture a range of accuracy and productivity requirements, and handle substrate sizes from 5” to 9” with flexible magazine configurations to maximize batch processing. Highlights cited for use include lowest cost per mask, superior measurement speed and low running cost, and deriving mask writer registration performance through precise calibration.