PCT-200CRS

Overview

The PCT-200CRS (2C-2D) system is presented as a dual-track mass-production platform described as "Dual Tracks for Mass Production (2 Coaters, 2 Developers)" and includes 4 spin stations. The system is configured with full load modules and includes Primer, hot plate ovens, chill plates, and high-capacity indexers. It is equipped with dual robot arms, dual end-effector handlers, stack-up modules, and automatic wafer size adjustments. The system uses dual PCs, monitors, and PLC controllers to provide stable and independent operation for each track. The PCT-200CRS is described with design priorities of high productivity, reliability, and throughput, along with footprint reduction, user-friendliness, flexible process flow, various interface tools, compliance with SECs/GEM standards, easy maintenance, chemical conservation, and energy efficiency. The PCT-200CRS is described as well-suited for high workloads in wafer manufacturing and for mass production environments. Its dual tracks with independent control for each track and the inclusion of 2 Coaters and 2 Developers support continuous, high-throughput processing. The combination of full load modules, 4 spin stations, and automation features (dual robot arms, automatic wafer size adjustments) is presented to enable reliable, high-productivity wafer processing.