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Centris® Sym3® Etch
Applied Material
Categories:
Photochemical Etching Systems
Model Overview
The Centris® Sym3® Etch is a production-scale semiconductor wafer etch tool designed to perform controlled dry (plasma) material removal for pattern transfer and profile shaping in wafer fabrication. It is positioned for integration into high-volume manufacturing lines where repeatability, recipe-ba...
Technical Specifications
Integrationintegration into high-volume manufacturing lines
Process Typecontrolled dry (plasma) material removal
Category PathSubtractive Manufacturing > Electrochemical/Chemical Machining > Chemical Machining Systems > Photochemical Etching Systems
Manufacturer ID3ac7ba29-f554-4cc9-b2f6-a655474b1267
Serviceabilitybuilt for serviceability and fab integration consistent with enterprise semiconductor manufacturing environments
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