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TWINSCAN XT:400M
ASML
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Model Overview
ASML TWINSCAN XT:400M is a deep-ultraviolet (DUV) photolithography wafer scanner in ASML’s TWINSCAN product family. As a DUV lithography system, its primary function is to project photomask patterns onto photoresist-coated semiconductor wafers using DUV illumination and high-precision optics and sta...
Technical Specifications
Tool TypeDUV photolithography wafer scanner
Workpiecesemiconductor wafers
Intended Usecontinuous fab throughput
Key Featureshigh-precision optics,high-precision stage motion,staged wafer handling and exposure sequencing
Architecturetwin-stage scanner
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