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Nanoquest II

Intlvac Thin Film Corporation

Categories:
Electrical Discharge Machining
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Model Overview

Nanoquest II is an Ion Beam Etching (IBE) system built on an ultra-high vacuum (UHV) platform with stainless steel construction and active thermal management. It uses a 22 cm RF Inductively Coupled Plasma (ICP) gridded ion source delivering ion energies from 100 to 1200 eV and beam currents exceedin...

Technical Specifications

Ion Source22 cm RF Inductively Coupled Plasma (ICP) gridded ion source
Stage Typewater-cooled, rotating, andtiltingsubstrate stage
HMI Display22” color flat-panel display
Beam Currentexceeding 1 Amp
Constructionultra-high vacuum (UHV) platform with stainless steel construction and active thermal management

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